Synthesis of Thin Zeolite Film of Silicalite-1 on Single Crystal Silicon Wafers

Gao Jincheng, Liu Jing, Yang Mei^a, Tang Zhenan^a, Zou Longjiang^b, Liu Yihui
(State Key Laboratory of Fine Chemicals, Dalian University of Technology, Dalian 116012
^a Institute of Sensor Technology, Dalian University of Technology
^b Center of Material Testing and Analysis, Dalian University of Technology, Dalian 116023)

Abstract The desired silicon sources were introduced on the single crystal silicon wafers (100) surface by the low temperature chemical vapor deposition (LTCVD). The Silicalite-1 zeolite crystals were obtained after the silicon wafers were treated with the vapor phase transport (VPT) method. To obtain the thin zeolite films with the secondary growth method, the silicon wafers with the zeolite crystal seeds were vertically put into the zeolite synthesis previous solution. After the direct in-situ crystallization, the continuous and density Silicalite-1 thin zeolite films were formed on the silicon wafers surface and the single crystal silicon wafers were not etched.
Key words Silicon wafer, Silicalite-1, Zeolite, Thin zeolite film, Gas sensor